ACLV-analysis in production and its impact on product performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 530-540

  Seltmann, Rolf ^a   Stephan, Rolf ^a   Mazur, Martin ^a   Spence, Christopher ^b   La Fontaine, Bruno ^b   Stankowski, Dirk ^a   Poock, Andre ^a   Grundke, Wolfram ^a  

^a IBM MICROELECTRONICS   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

ACLV; Dose control; Flare; Focus; Iso dense bias; Microprocessor; Reticle; Scanner

Indexed keywords

ABERRATIONS; FOCUSING; INTEGRATED CIRCUIT LAYOUT; LEAKAGE CURRENTS; MICROPROCESSOR CHIPS; OPTICAL INSTRUMENT LENSES; PRODUCTION; TRANSISTORS;

ACROSS CHIP LINE-WIDTH VARIATION; ACROSS WAFER LINE-WIDTH VARIATION; DOSE CONTROL; FLARE; FOCUS CONTROL; ISO-DENSE-BIAS; RETICLE; SCANNER;

LITHOGRAPHY;

EID: 0141610683     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485337     Document Type: Conference Paper

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