An investigation into mask contribution to device performance and chip functionality

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 75-84

  Watts, Andrew J ^a   Rankin, Jed H ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FREQUENCIES; INTEGRATED CIRCUITS; MICROPROCESSOR CHIPS; SILICON WAFERS;

WAFER PRINTING;

MASKS;

EID: 0036456576     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.476931     Document Type: Article

References (9)

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