Matching OPC and masks on 300mm lithography tools utilizing variable illumination settings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 872-880

  Palitzsch, K ^a   Kubis, M ^a   Schroder U P ^a   Schumacher, K ^a   Frangen, A ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

300 mm; CD control; Illumination settings; OPC matching

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; IMAGING SYSTEMS; LIGHT TRANSMISSION; MASKS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

300 MM; CD CONTROL; ILLUMINATION SETTINGS; OPC MATCHING; OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 3843126359     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.532328     Document Type: Conference Paper

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