Controlling Defocus Impact on OPC Performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 847-854

  Takase, Shinichi ^a   Qian, Qi De ^b  

^a NTT CORPORATION   (Japan)

^b IC Scope Research   (United States)

Author keywords

Layout verification; Mask; OPC; Photolithography; Simulation

Indexed keywords

DEFOCUS EFFECTS; LAYOUT VERIFICATION; OPTICAL PROXIMITY CORRECTION (OPC);

COMPUTER SIMULATION; FOCUSING; IMAGING SYSTEMS; INTEGRATED CIRCUIT LAYOUT; MASKS; OPTICAL DESIGN; OPTICAL ENGINEERING; OPTICAL VARIABLES MEASUREMENT; PATTERN MATCHING; SENSITIVITY ANALYSIS;

PHOTOLITHOGRAPHY;

EID: 1642555638     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504380     Document Type: Conference Paper

References (7)

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