Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 45-56

  Zhang, Gary ^a   Wang, Changan ^a   Tan, Colin ^a   Ilzhoefer, John ^a   Atkinson, Chris ^a   Renwick, Stephen P ^b   Slonaker, Steve ^b   Godfrey, David ^b   Fruga, Cathy ^b  

^a TEXAS INSTRUMENTS   (United States)

^b NIKON PRECISION INC   (United States)

Author keywords

ACLV; Illumination pupil fill; Lens aberrations; Lithography simulation; Pupil gram analysis; Scanner fingerprinting; Scatterometer; V H bias

Indexed keywords

ABERRATIONS; CAMERAS; COHERENT LIGHT; INTERFEROMETERS; LIGHTING; MASKS; OPTICAL INSTRUMENT LENSES; PATTERN MATCHING;

ACROSS CHIP LINE WIDTH VARIATION; CRITICAL DIMENSION; ILLUMINATION PUPIL FILL MEASUREMENT; ILLUMINATOR RADIANCE PROFILE; OFF-AXIS ILLUMINATION;

SCANNING;

EID: 0141610852     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485352     Document Type: Conference Paper

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