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Volumn 28, Issue 8, 2005, Pages 711-721

Characterization of structural films using microelectromechanical resonators

Author keywords

Fatigue; Reaction layer fatigue; Silicon; Thin films

Indexed keywords

CRACK PROPAGATION; FATIGUE OF MATERIALS; FATIGUE TESTING; FRACTURE MECHANICS; MICROELECTROMECHANICAL DEVICES; OSCILLATORS (ELECTRONIC); RESONATORS; SCANNING ELECTRON MICROSCOPY; STRESS ANALYSIS; STRESSES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 22544450797     PISSN: 8756758X     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1460-2695.2005.00921.x     Document Type: Review
Times cited : (11)

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