Synthesis of fluorinated materials for 193 nm immersion lithography and 157 nm lithography

Journal of Photopolymer Science and Technology

Volumn 18, Issue 5, 2005, Pages 631-639

  Yamashita, T ^a   Ishikawa, T ^a   Yoshida, T ^a   Hayamai, T ^a   Araki, T ^a   Aoyama, H ^a   Hagiwara, T ^b   Itani, T ^b   Fujii, K ^b  

^a DAIKIN INDUSTRIES LTD   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

157 nm lithography; 193 nm lithography; 193 nm immersion lithography; Fluoropolymer; Quartz Crystal Microbalance (QCM); Resist; Top coat

Indexed keywords

EID: 22144457429     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.631     Document Type: Article

References (32)

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