Design strategies for 157 nm single-layer photoresists: Lithographic evaluation of a poly(α-trifluoromethyl vinyl alcohol) copolymer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Schmaljohann, Dirk ^a   Bae, Young Cheol ^a   Weibel, Gina L ^a   Hamad, Alyssandrea H ^a   Ober, Christopher K ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; FLUORINE CONTAINING POLYMERS; PLASTIC FILMS; POLYVINYL ALCOHOLS; SOLUBILITY; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS; POLYTRIFLUOROMETHYL VINYL ALCOHOL;

PHOTORESISTS;

EID: 0033718295     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)