The study on dry etch resistance of fluorine functionalized polymers

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 486-496

  Koh, Meiten ^a   Ishikawa, Takuji ^a   Araki, Takayuki ^a   Aoyama, Hirokazu ^a   Yamashita, Tsuneo ^a   Yamazaki, Tamio ^a,b   Watanabe, Hiroyuki ^a,b   Toriumi, Minoru ^a,b   Itani, Toshiro ^a,b  

^a DAIKIN INDUSTRIES LTD   (Japan)

^b NONE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL RESISTANCE; COMPOSITION EFFECTS; DRY ETCHING; FLUORINE; FUNCTIONAL POLYMERS; MATHEMATICAL MODELS;

DRY ETCH RESISTANCE;

PHOTORESISTS;

EID: 0036029117     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474246     Document Type: Article

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