New materials for 157 nm photoresists: Characterization and properties

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Crawford, Michael K ^a   Feiring, Andrew E ^a   Feldman, Jerald ^a   French, Roger H ^a   Periyasamy, Mookkan ^a   Schadt III, Frank L ^a   Smalley, Robert J ^a   Zumsteg, Fredrick C ^a   Kunz, Roderick R ^a   Rao, Veena ^a   Liao, Ling ^a   Holl, Susan M ^a  

^a DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; LIGHT ABSORPTION; PLASMA ETCHING; POLYTETRAFLUOROETHYLENES; SOLUBILITY; TRANSPARENCY;

NORBORNENE;

PHOTORESISTS;

EID: 0033722431     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)