A new monocyclic fluoropolymer structure for 157-nm photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 151-158

  Takebe, Yoko ^a   Eda, Masataka ^a   Okada, Shinji ^a   Yokokoji, Osamu ^a   Irie, Shigeo ^b   Otoguro, Akihiko ^b   Fujii, Kiyoshi ^b   Itani, Toshiro ^c  

^a ASAHI GLASS CO LTD   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^c RENESAS TECHNOLOGY CORP   (Japan)

Author keywords

157 nm lithography; Cyclo polymerization; Dissolution rate; Etching resistance; Fluoropolymer; Photoresist; Transparency

Indexed keywords

ADDITION REACTIONS; DISSOLUTION; ETCHING; FLUORINE CONTAINING POLYMERS; POLYMERIZATION; SYNTHESIS (CHEMICAL);

157NM LITHOGRAPHY; CYCLO POLYMERIZATION; DISSOLUTION RATE; ETCHING RESISTANCE;

PHOTORESISTS;

EID: 3843143816     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533932     Document Type: Conference Paper

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