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Volumn 497, Issue 1-3, 2002, Pages 333-340

Microcrystalline silicon nucleation sites in the sub-surface of hydrogenated amorphous silicon

(3) Fujiwara, Hiroyuki a Kondo, Michio a Matsuda, Akihisa a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Amorphous surfaces; Ellipsometry; Hydrogen atom; Infrared absorption spectroscopy; Nucleation; Plasma processing; Silicon

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS SILICON; CHEMICAL BONDS; ELLIPSOMETRY; HYDROGENATION; INFRARED RADIATION; NUCLEATION; PHASE TRANSITIONS; PLASMA APPLICATIONS; POLYSILICON;

MICROCRYSTALLINE SILICON; TOTAL REFLECTION SPECTROSCOPY;

SURFACE STRUCTURE;

EID: 0037137889 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01665-X Document Type: Article

Times cited : (55)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.