Structure and hydrogen bonding in plasma deposited polymorphous silicon thin films

EPJ Applied Physics

Volumn 26, Issue 1, 2004, Pages 17-27

  Lebib, S ^a   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; ELECTRIC INSULATORS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; MORPHOLOGY; NANOTUBES; PLASMAS; RAMAN SPECTROSCOPY; SEMICONDUCTOR MATERIALS; TEMPERATURE; X RAY DIFFRACTION ANALYSIS;

CLUSTERS; HYDROGEN EVOLUTION MEASUREMENTS; HYDROGEN-RELATED MATERIAL STRUCTURE; ISOCHRONAL ANNEALING; NANOSCALE MATERIALS; POLYMORPHOUS SILICON THIN FILMS;

THIN FILMS;

EID: 1942489039     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2004018     Document Type: Article

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