The interaction of atomic hydrogen with very thin amorphous hydrogenated silicon films analyzed using in situ real time infrared spectroscopy: Reaction rates and the formation of hydrogen platelets

Journal of Applied Physics

Volumn 84, Issue 1, 1998, Pages 489-495

  Von Keudell, A ^a,b   Abelson, J R ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DIFFUSION; ELECTRONIC DENSITY OF STATES; ETCHING; FILM GROWTH; HYDROGEN BONDS; HYDROGENATION; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MOLECULAR STRUCTURE; MOLECULAR VIBRATIONS; REACTION KINETICS;

AMORPHOUS HYDROGENATED SILICON; DIFFUSION KINETICS; HYDROGEN CHEMICAL ANNEALING;

THIN FILMS;

EID: 0032109123     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368082     Document Type: Article

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