Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure

Journal of Applied Physics

Volumn 93, Issue 6, 2003, Pages 3198-3206

  Novikova, T ^a   Kalache, B ^a   Bulkin, P ^a   Hassouni, K ^b   Morscheidt, W ^b   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b UNIVERSITÉ PARIS 13   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; COMPUTATIONAL FLUID DYNAMICS; DEPOSITION; ELECTRIC DISCHARGES; MATHEMATICAL MODELS; PRESSURE EFFECTS; SILICON;

HYDROGEN PLASMAS;

PLASMAS;

EID: 0037445037     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1555678     Document Type: Article

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