Links between hydrogen bonding, residual stress, structural properties and metastability in hydrogenated nanostructured silicon thin films

Journal of Physics Condensed Matter

Volumn 15, Issue 43, 2003, Pages 7185-7200

  Vignoli, S ^a   Butte R ^a,b   Meaudre, R ^a   Meaudre, M ^a   Brenier, R ^a  

^a UNIVERSITÉ LYON 1   (France)

^b UNIVERSITY OF SHEFFIELD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; HYDROGENATION; INTERFACES (MATERIALS); NANOSTRUCTURED MATERIALS; OPTOELECTRONIC DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; VIBRATIONS (MECHANICAL);

AMORPHOUS MATRIX; HYDROGENATED POLYMORPHOUS SILICON THIN FILMS; METASTABILITY;

AMORPHOUS SILICON;

EID: 0242636520     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/15/43/004     Document Type: Article

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