Fabrication of micromechanical structures in silicon using SF6/O2 gas mixtures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3903, Issue , 1999, Pages 2-8

  Paul, A K ^a   Dimri, A K ^a   Mohan, S ^a  

^a CSIR CENTRAL SCIENTIFIC INSTRUMENTS ORGANISATION   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ARGON; FLOW OF FLUIDS; MICROMACHINING; MIXTURES; OXYGEN; PHOTORESISTS; PLASMAS; PRESSURE EFFECTS; REACTIVE ION ETCHING; SILICA; SILICON WAFERS;

GAS MIXTURE; MICROMECHANICAL STRUCTURES; OXYGEN PLASMA; PATTERN TRANSFER; SILICON ETCH RATES;

MICROELECTROMECHANICAL DEVICES;

EID: 0033311081     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)