An emission actinometric method for measuring of plasmachemical reaction kinetic parameters with discharge power modulation by a series of short probing pulses

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1406-1410

  Shogun, V ^a   Tyablikov, A ^a   Abachev, M ^b   Pashkov, V ^c   Scharff, W ^d   Wallendorf, T ^d  

^a Multicharged Ions Spectra Data Center of VNIIFTRI   (Russian Federation)

^b SAMSUNG Electronics   (South Korea)

^c NPO Submikron   (Russian Federation)

^d IfU GmbH   (Germany)

Author keywords

Discharge power; Emission; Plasmachemical

Indexed keywords

EID: 0039572514     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00259-4     Document Type: Article

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