-
1
-
-
0022223020
-
"Acceleration factor for thin gate oxide stressing"
-
J. W. McPherson and D. A. Baglee, "Acceleration factor for thin gate oxide stressing," in Proc. IRPS, 1985, p. 1.
-
(1985)
Proc. IRPS
, pp. 1
-
-
McPherson, J.W.1
Baglee, D.A.2
-
2
-
-
0032637383
-
"A unified gate reliability model"
-
C. Hu, "A unified gate reliability model," in Proc. IRPS, 1999, pp. 47-51.
-
(1999)
Proc. IRPS
, pp. 47-51
-
-
Hu, C.1
-
3
-
-
0024122432
-
"Modeling and characterization of gare oxide reliability"
-
Dec
-
J. C. Lee, I. C. Chen, and C. Hu, "Modeling and characterization of gare oxide reliability," IEEE Trans. Electron Devices, vol. 35, no. 12, pp. 2268-2278, Dec. 1988.
-
(1988)
IEEE Trans. Electron Devices
, vol.35
, Issue.12
, pp. 2268-2278
-
-
Lee, J.C.1
Chen, I.C.2
Hu, C.3
-
4
-
-
0000143442
-
"Degradation and breakdown of silicon dioxide films on silicon"
-
Nov
-
D. J. DiMaria, D. Arnold, and E. Cartier, "Degradation and breakdown of silicon dioxide films on silicon," Appl. Phys. Lett., vol. 61, no. 19, pp. 2329-2331, Nov. 1992.
-
(1992)
Appl. Phys. Lett.
, vol.61
, Issue.19
, pp. 2329-2331
-
-
DiMaria, D.J.1
Arnold, D.2
Cartier, E.3
-
5
-
-
0008536196
-
"New insight in the relation between electron trap generation and the statistical properties of oxide breakdown"
-
Apr
-
R. Degraeve, G. Groeseneken, R. Bellens, J. L. Ogier, M. Depas, P. J. Roussel, and H. E. Maes, "New insight in the relation between electron trap generation and the statistical properties of oxide breakdown," IEEE Trans. Electron Devices, vol. 45, no. 4. pp. 904-911, Apr. 1998.
-
(1998)
IEEE Trans. Electron Devices
, vol.45
, Issue.4
, pp. 904-911
-
-
Degraeve, R.1
Groeseneken, G.2
Bellens, R.3
Ogier, J.L.4
Depas, M.5
Roussel, P.J.6
Maes, H.E.7
-
6
-
-
0032646378
-
"Field dependent critical trap density for thin gate oxide breakdown"
-
K. P. Cheung, C. T. Liu, C. P. Chang, J. I. Colonell, W. Y.-C. Lai, R. Liu, J. F. Miner, C. S. Pai, H. Vaidya, J. T. Clemens, and E. Hasegawa, "Field dependent critical trap density for thin gate oxide breakdown," in Proc. IRPS, 1999, pp. 52-56.
-
(1999)
Proc. IRPS
, pp. 52-56
-
-
Cheung, K.P.1
Liu, C.T.2
Chang, C.P.3
Colonell, J.I.4
Lai, W.Y.-C.5
Liu, R.6
Miner, J.F.7
Pai, C.S.8
Vaidya, H.9
Clemens, J.T.10
Hasegawa, E.11
-
7
-
-
0033314086
-
"An anode hole injection percolation model for oxide breakdown - The "doom's day" Scenario revisited"
-
M. A. Alam, J. Bude, B. Weir, P. Silverman, A. Ghetti, D. Monroe, K. P. Cheung, and S. Moccio, "An anode hole injection percolation model for oxide breakdown - The "doom's day" scenario revisited," in IEDM Tech. Dig., 1999, pp. 715-718.
-
(1999)
IEDM Tech. Dig.
, pp. 715-718
-
-
Alam, M.A.1
Bude, J.2
Weir, B.3
Silverman, P.4
Ghetti, A.5
Monroe, D.6
Cheung, K.P.7
Moccio, S.8
-
8
-
-
0031332017
-
"Ultimate limit for defect generation in ultra thin silicon dioxide"
-
Dec
-
D. J. DiMaria and J. H. Stathis, "Ultimate limit for defect generation in ultra thin silicon dioxide," Appl. Phys. Lett., vol. 71, no. 21, pp. 3230-3232, Dec. 1997.
-
(1997)
Appl. Phys. Lett.
, vol.71
, Issue.21
, pp. 3230-3232
-
-
DiMaria, D.J.1
Stathis, J.H.2
-
9
-
-
0033741528
-
"Experimental evidence for voltage driven breakdown models in ultrathin gate oxides"
-
P. E. Nicollian, W. R. Hunter, and J. C. Hu, "Experimental evidence for voltage driven breakdown models in ultrathin gate oxides," in Proc. IRPS, 2000, pp. 7-15.
-
(2000)
Proc. IRPS
, pp. 7-15
-
-
Nicollian, P.E.1
Hunter, W.R.2
Hu, J.C.3
-
10
-
-
0042164631
-
2-based dielectric to its limit"
-
2-based dielectric to its limit," Microelectron. Reliabil., vol. 43, pp. 1175-1184, 2003.
-
(2003)
Microelectron. Reliabil.
, vol.43
, pp. 1175-1184
-
-
Wu, Y.E.1
Sune, J.2
Lai, W.3
Vayshenker, A.4
Nowak, E.5
Harmon, D.6
-
11
-
-
0033880145
-
"Soft breakdown conduction in ultrathin (3-5 nm) gate dielectrics"
-
Jan
-
E. Miranda, J. Sune, R. Rodriguez, M. Nafria, X. Aymerich, L. Fonseca, and F. Campabadal, "Soft breakdown conduction in ultrathin (3-5 nm) gate dielectrics," IEEE Trans. Electron Devices, vol. 47, no. 1, pp. 82-88, Jan. 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, Issue.1
, pp. 82-88
-
-
Miranda, E.1
Sune, J.2
Rodriguez, R.3
Nafria, M.4
Aymerich, X.5
Fonseca, L.6
Campabadal, F.7
-
12
-
-
0032256631
-
"A detailed study of soft- and pre-soft-breakdowns in small geometry MOS structures"
-
T. Sakura, H. Utsunumyia, Y. Kamakura, and K. Taniguchi, "A detailed study of soft- and pre-soft-breakdowns in small geometry MOS structures," in IEDM Tech. Dig., 1998, pp. 183-186.
-
(1998)
IEDM Tech. Dig.
, pp. 183-186
-
-
Sakura, T.1
Utsunumyia, H.2
Kamakura, Y.3
Taniguchi, K.4
-
13
-
-
0030242886
-
"Soft breakdown of ultrathin gate oxide layers"
-
Sep
-
M. Depas, T. Nigam, and M. M. Heynes, "Soft breakdown of ultrathin gate oxide layers," IEEE Trans. Electron Devices, vol. 43, no. 9, pp. 1499-1504, Sep. 1996.
-
(1996)
IEEE Trans. Electron Devices
, vol.43
, Issue.9
, pp. 1499-1504
-
-
Depas, M.1
Nigam, T.2
Heynes, M.M.3
-
14
-
-
0010044340
-
"Wear-out, breakdown occurrence and failure detection in 18-25 Å ultrathin oxides"
-
F. Monsieur, E. Vincent, G. Pananakakis, and G. Ghibaudo, "Wear-out, breakdown occurrence and failure detection in 18-25 Å ultrathin oxides," in Proc. WoDiM, 2000, pp. 24-25.
-
(2000)
Proc. WoDiM
, pp. 24-25
-
-
Monsieur, F.1
Vincent, E.2
Pananakakis, G.3
Ghibaudo, G.4
-
15
-
-
0028755085
-
"Quasibreakdown of ultrathin gate oxide under high field stress"
-
S. H. Lee, B. J. Cho, J. C. Kim, and S. H. Choi, "Quasibreakdown of ultrathin gate oxide under high field stress," in IEDM Tech. Dig. 1994, pp. 605-608.
-
(1994)
IEDM Tech. Dig.
, pp. 605-608
-
-
Lee, S.H.1
Cho, B.J.2
Kim, J.C.3
Choi, S.H.4
-
16
-
-
0043101299
-
"Quasi breakdown in ultrathin gate dielectrics"
-
A. Halimaoui, O. Briere, and G. Ghibudo, "Quasi breakdown in ultrathin gate dielectrics," Micr. Eng., vol. 36, pp. 157-160, 1997.
-
(1997)
Micr. Eng.
, vol.36
, pp. 157-160
-
-
Halimaoui, A.1
Briere, O.2
Ghibudo, G.3
-
17
-
-
0030785003
-
"Electrical stress-induced variable range hopping conduction in ultrathin silicon dioxides"
-
K. Okada and K. Taniguchi, "Electrical stress-induced variable range hopping conduction in ultrathin silicon dioxides," Appl. Phys. Lett. vol. 70, pp. 351-353, 1997.
-
(1997)
Appl. Phys. Lett.
, vol.70
, pp. 351-353
-
-
Okada, K.1
Taniguchi, K.2
-
18
-
-
0029514106
-
"A consistent model for the thickness dependence of intrinsic breakdown in ultrathin oxides"
-
R. Degraeve, G. Groeseneken, R. Bellens, M. Depas, and H. A Maes, "A consistent model for the thickness dependence of intrinsic breakdown in ultrathin oxides," in IEDM Tech. Dig., 1995, pp. 863-866.
-
(1995)
IEDM Tech. Dig.
, pp. 863-866
-
-
Degraeve, R.1
Groeseneken, G.2
Bellens, R.3
Depas, M.4
Maes, H.A.5
-
19
-
-
0001004010
-
"Model for the current-voltage characteristics of ultrathin gate oxides after soft breakdown"
-
Oct
-
M. Houssa, T. Nigam, P. W. Mertens, and M. M. Heynes, "Model for the current-voltage characteristics of ultrathin gate oxides after soft breakdown," J. Appl. Phys., vol. 84, no. 8, pp. 4351-4355, Oct. 1998.
-
(1998)
J. Appl. Phys.
, vol.84
, Issue.8
, pp. 4351-4355
-
-
Houssa, M.1
Nigam, T.2
Mertens, P.W.3
Heynes, M.M.4
-
20
-
-
0000842547
-
"Soft breakdown in ultrathin gate oxides: Correlation with the percolation theory of nonlinear conductors"
-
Jul
-
M. Houssa, T. Nigam, P. W. Mertens, and M. M. Heynes, "Soft breakdown in ultrathin gate oxides: correlation with the percolation theory of nonlinear conductors," Appl. Phys. Lett., vol. 73, no. 4, pp. 514-516, Jul. 1998.
-
(1998)
Appl. Phys. Lett.
, vol.73
, Issue.4
, pp. 514-516
-
-
Houssa, M.1
Nigam, T.2
Mertens, P.W.3
Heynes, M.M.4
-
21
-
-
0032254844
-
"Point contact conduction at the oxide breakdown of MOS devices"
-
E. Miranda, J. Suñe, M. Naifría, and X. Aymerich, "Point contact conduction at the oxide breakdown of MOS devices," in IEDM Tech. Dig., 1998, pp. 191-194.
-
(1998)
IEDM Tech. Dig.
, pp. 191-194
-
-
Miranda, E.1
Suñe, J.2
Naifría, M.3
Aymerich, X.4
-
23
-
-
0036089047
-
"A thorough investigation of progressive breakdown in ultrathin oxides. Physical understanding and application for industrial reliability assessment"
-
F. Monsieur, E. Vincent, D. Roy, S. Bruyere, J. C. Vildeuil, G. Pananakakis, and G. Ghibaudo, "A thorough investigation of progressive breakdown in ultrathin oxides. Physical understanding and application for industrial reliability assessment," in Proc. IRPS, 2002, pp. 45-54.
-
(2002)
Proc. IRPS
, pp. 45-54
-
-
Monsieur, F.1
Vincent, E.2
Roy, D.3
Bruyere, S.4
Vildeuil, J.C.5
Pananakakis, G.6
Ghibaudo, G.7
-
24
-
-
0035714563
-
"Statistical model for stress induced leakage current and pre-breakdown currents jumps in ultrathin oxide layers"
-
R. Degraeve, B. Kaczer, F. Schuler, M. Lorenzini, D. Wellekens, P. Hendrickx, J. Van Houdt, L. Haspeslagh, G. Tempel, and G. Groeseneken, "Statistical model for stress induced leakage current and pre-breakdown currents jumps in ultrathin oxide layers," in IEDM Tech. Dig., 2001.
-
(2001)
IEDM Tech. Dig.
-
-
Degraeve, R.1
Kaczer, B.2
Schuler, F.3
Lorenzini, M.4
Wellekens, D.5
Hendrickx, P.6
Houdt, J.7
Haspeslagh, L.8
Tempel, G.9
Groeseneken, G.10
-
25
-
-
0036685471
-
"Microbreakdown in small-area ultrathin gate oxides"
-
Aug
-
G. Cellere, M. G. Valentini, L. Larcher, and A. Paccagnella, "Microbreakdown in small-area ultrathin gate oxides," IEEE Trans. Electron Devices, vol. 49, no. 8, pp. 1367-1374, Aug. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.8
, pp. 1367-1374
-
-
Cellere, G.1
Valentini, M.G.2
Larcher, L.3
Paccagnella, A.4
-
26
-
-
33747905416
-
"Relation between breakdown mode and location in short channel nMOSFET's and its impact on reliability specifications"
-
Sep
-
R. Degraeve, B. Kraczer, A. De Keersgieter, and G. Groeseneken, "Relation between breakdown mode and location in short channel nMOSFET's and its impact on reliability specifications," IEEE Trans. Dev. Mater. Rel., vol. 1, no. 3, pp. 163-169, Sep. 2001.
-
(2001)
IEEE Trans. Dev. Mater. Rel.
, vol.1
, Issue.3
, pp. 163-169
-
-
Degraeve, R.1
Kraczer, B.2
Keersgieter, A.3
Groeseneken, G.4
-
27
-
-
0035498765
-
"Soft breakdown at all positions along the n-MOSFET"
-
B. E. Weir, M. A. Alam, and P. J. Silverman, "Soft breakdown at all positions along the n-MOSFET," Micr. Eng., vol. 59, pp. 17-23, 2001.
-
(2001)
Micr. Eng.
, vol.59
, pp. 17-23
-
-
Weir, B.E.1
Alam, M.A.2
Silverman, P.J.3
-
28
-
-
0035398865
-
"Post soft breakdown characteristics of deep submicron MOSFET's with ultrathin gate oxide"
-
Jul
-
M. Y. Tsai, H. C. Lin, D. Y. Lee, and T. H. Huang, "Post soft breakdown characteristics of deep submicron MOSFET's with ultrathin gate oxide," IEEE Electron Device Lett., vol. 22, no. 7, pp. 348-350, Jul. 2001.
-
(2001)
IEEE Electron Device Lett.
, vol.22
, Issue.7
, pp. 348-350
-
-
Tsai, M.Y.1
Lin, H.C.2
Lee, D.Y.3
Huang, T.H.4
-
29
-
-
0032661176
-
"Influence of soft breakdown on NMOSFET device characteristics"
-
T. Pompl, H. Wurzer, M. Keber, R. C. W. Williams, and I. Eisele, "Influence of soft breakdown on NMOSFET device characteristics," in Proc. IRPS, 1999, pp. 82-87.
-
(1999)
Proc. IRPS
, pp. 82-87
-
-
Pompl, T.1
Wurzer, H.2
Keber, M.3
Williams, R.C.W.4
Eisele, I.5
-
30
-
-
0037972834
-
"Collapse of MOSFET drain current after soft breakdown and its dependence on the transistor aspect ratio W/L"
-
A. Cester, S. Cimino, A. Paccagnella, G. Ghidini, and G. Guegan, "Collapse of MOSFET drain current after soft breakdown and its dependence on the transistor aspect ratio W/L," in Proc. IRPS, 2003, pp. 189-195.
-
(2003)
Proc. IRPS
, pp. 189-195
-
-
Cester, A.1
Cimino, S.2
Paccagnella, A.3
Ghidini, G.4
Guegan, G.5
-
32
-
-
0036772475
-
"Plasma induced micro breakdown in small-area MOSFETs"
-
Oct
-
G. Cellere, M. G. Valentini, L. Larcher, and A. Paccagnella, "Plasma induced micro breakdown in small-area MOSFETs," IEEE Trans. Electron Devices, vol. 49, no. 10, pp. 1768-1774, Oct. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.10
, pp. 1768-1774
-
-
Cellere, G.1
Valentini, M.G.2
Larcher, L.3
Paccagnella, A.4
-
33
-
-
0033080259
-
"Experimental evidence of inelastic tunneling in stress-induced leakage current"
-
Mar
-
S. Takagi, N. Yasuda, and A. Toriumi, "Experimental evidence of inelastic tunneling in stress-induced leakage current," IEEE Trans. Electron Devices, vol. 46, no. 3, pp. 335-341, Mar. 1999,
-
(1999)
IEEE Trans. Electron Devices
, vol.46
, Issue.3
, pp. 335-341
-
-
Takagi, S.1
Yasuda, N.2
Toriumi, A.3
-
34
-
-
0036722765
-
2 interface damage in CMOS"
-
Sep
-
2 interface damage in CMOS," Microelectron. Eng., vol. 63/4, pp. 433-442, Sep. 2002.
-
(2002)
Microelectron. Eng.
, vol.4
, Issue.63
, pp. 433-442
-
-
Cellere, G.1
Valentini, M.G.2
Paccagnella, A.3
-
35
-
-
0033741526
-
"Detection of thin oxide (3.5 nm) dielectric degradation due to charging damage by rapid-ramp breakdown"
-
T. Hook, D. Harmon, and L. Chuan, "Detection of thin oxide (3.5 nm) dielectric degradation due to charging damage by rapid-ramp breakdown," in Proc. IRPS, 2000, pp. 377-388.
-
(2000)
Proc. IRPS
, pp. 377-388
-
-
Hook, T.1
Harmon, D.2
Chuan, L.3
-
36
-
-
2342516744
-
"Collapse of drain current after soft breakdown"
-
March
-
A. Cester, A. Paccagnella, G. Ghiaini, S. Deleonibus, and G. Guegan, "Collapse of drain current after soft breakdown," IEEE Trans. Device Mater. Reliabil., vol. 4, no. 1, pp. 63-72, March 2004.
-
(2004)
IEEE Trans. Device Mater. Reliabil.
, vol.4
, Issue.1
, pp. 63-72
-
-
Cester, A.1
Paccagnella, A.2
Ghiaini, G.3
Deleonibus, S.4
Guegan, G.5
-
37
-
-
0033733540
-
"Field acceleration for oxide breakdown: Can an accurate anode hole injection model resolve the E versus 1/E controversy?"
-
M. A. Alam, J. Burle, and A. Ghetti, "Field acceleration for oxide breakdown: can an accurate anode hole injection model resolve the E versus 1/E controversy?," in Proc. IRPS, 2000, pp. 21-26.
-
(2000)
Proc. IRPS
, pp. 21-26
-
-
Alam, M.A.1
Burle, J.2
Ghetti, A.3
-
38
-
-
33644616608
-
2 films and MOS devices with a conductive atomic force microscope"
-
December
-
2 films and MOS devices with a conductive atomic force microscope," IEEE Trans. Devices Mater. Reliabil., vol. 2, no. 4, pp. 94-101, December 2002.
-
(2002)
IEEE Trans. Devices Mater. Reliabil.
, vol.2
, Issue.4
, pp. 94-101
-
-
Porti, M.1
Blüm, M.C.2
Nafria, M.3
Aymerich, X.4
-
39
-
-
0042969119
-
"Novel FIB-based sample preparation technique for TEM analysis of ultrathin gare oxide breakdown"
-
J. C. Reiner, P. Gasser, and U. Sennheuser, "Novel FIB-based sample preparation technique for TEM analysis of ultrathin gare oxide breakdown," Microelecrron. Reliabil., vol. 42, pp. 1753-1757, 2002.
-
(2002)
Microelecrron. Reliabil.
, vol.42
, pp. 1753-1757
-
-
Reiner, J.C.1
Gasser, P.2
Sennheuser, U.3
-
40
-
-
0347155006
-
"Reduction of thermal damage in ultrathin gate oxides after intrinsic dielectric breakdown"
-
Sep
-
S. Lombardo, A. La Magna, I. Crupi, C. Gerardi, and F. Crupi, "Reduction of thermal damage in ultrathin gate oxides after intrinsic dielectric breakdown," Appl. Phys. Lett., vol. 79, no. 10, pp. 1522-1524, Sep. 2001.
-
(2001)
Appl. Phys. Lett.
, vol.79
, Issue.10
, pp. 1522-1524
-
-
Lombardo, S.1
La Magna, A.2
Crupi, I.3
Gerardi, C.4
Crupi, F.5
-
41
-
-
0036712468
-
"Polarity-dependent dielectric breakdown-induced epitaxy (DBIE) in Si MOSFETs"
-
Sep
-
C. H. Tung, K. L. Pey, W. H. Lin, and M. K. Radhakrishnan, "Polarity-dependent dielectric breakdown-induced epitaxy (DBIE) in Si MOSFETs," IEEE Electron Device Lett., vol. 23, no. 9, pp. 526-528, Sep. 2002.
-
(2002)
IEEE Electron Device Lett.
, vol.23
, Issue.9
, pp. 526-528
-
-
Tung, C.H.1
Pey, K.L.2
Lin, W.H.3
Radhakrishnan, M.K.4
-
42
-
-
2342625952
-
"Gate-dielectric-breakdown-induced microstructural damage in MOSFETs"
-
Mar
-
L. J. Tang, K. L. Pey, C. H. Tung, M. K. Radhakrishnan, and W. H. Lin, "Gate-dielectric-breakdown-induced microstructural damage in MOSFETs," IEEE Trans. Device Mater. Reliabil., vol. 4, no. 1, pp. 38-45, Mar. 2004.
-
(2004)
IEEE Trans. Device Mater. Reliabil.
, vol.4
, Issue.1
, pp. 38-45
-
-
Tang, L.J.1
Pey, K.L.2
Tung, C.H.3
Radhakrishnan, M.K.4
Lin, W.H.5
|