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Materials Research Society Symposium - Proceedings

Volumn 609, Issue , 2000, Pages

Nucleation mechanism of microcrystalline silicon studied by real time spectroscopic ellipsometry and infrared spectroscopy

(4) Fujiwara, H a Toyoshima, Y a Kondo, M a Matsuda, A a

a ELECTROTECHNICAL LABORATORY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; ELLIPSOMETRY; INFRARED SPECTROSCOPY; NUCLEATION; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SPECTROSCOPIC ANALYSIS;

SPECTROSCOPIC ELLIPSOMETRY;

FILM GROWTH;

EID: 0034429786 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-609-a2.1 Document Type: Conference Paper

Times cited : (11)

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