Distance-dependent electron hopping conductivity and nanoscale lithography of chemically-linked gold monolayer protected cluster films

Analytica Chimica Acta

Volumn 496, Issue 1-2, 2003, Pages 3-16

  Zamborini, Francis P ^a   Smart, Laura E ^a   Leopold, Michael C ^b,c   Murray, Royce W ^b  

^a UNIVERSITY OF LOUISVILLE   (United States)

^b UNIVERSITY OF NORTH CAROLINA   (United States)

^c UNIVERSITY OF RICHMOND   (United States)

Author keywords

AFM; Clusters; Conductivity; Gold; Lithography; Nanoparticles

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARGE TRANSFER; ELECTRON TUNNELING; LITHOGRAPHY; METALLIC FILMS; SCANNING TUNNELING MICROSCOPY;

ELECTRONIC COUPLING FACTOR;

MONOLAYERS;

ALKANE DERIVATIVE; CARBENE; CARBOXYLIC ACID DERIVATIVE; COPPER; GOLD; HYDROCARBON; LIGAND; NANOPARTICLE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL BOND; COUPLING FACTOR; ELECTRIC CONDUCTIVITY; ELECTRON TRANSPORT; FILM; IMAGING; PRIORITY JOURNAL; SCANNING TUNNELING MICROSCOPY; TEMPERATURE DEPENDENCE; ULTRAVIOLET SPECTROSCOPY;

EID: 0242361607     PISSN: 00032670     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.aca.2002.10.003     Document Type: Article

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