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Chemistry of Materials

Volumn 13, Issue 1, 2001, Pages 87-95

Monolayer-protected clusters: Molecular precursors to metal films

(6) Peter Wuelfing, W a Zamborini, F P a Templeton, A C a Wen, X a Yoon, H a,b Murray, R W a

a University of North Carolina at Chapel Hill (United States)

b UNIVERSITY OF CHICAGO (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALKANE DERIVATIVE; ALLOY; CARBOXYLIC ACID DERIVATIVE; COPPER DERIVATIVE; DISULFIDE; GOLD COMPLEX; METAL COMPLEX; THIOL DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTROCHEMICAL ANALYSIS; ELECTROCHEMISTRY; ELECTRODE; FILM; ROENTGEN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE DEPENDENCE; THERMAL ANALYSIS; VOLATILIZATION; X RAY ANALYSIS;

EID: 0035111408 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm0005440 Document Type: Article

Times cited : (113)

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