Correlation between plasma parameters, microstructure and optical properties of sputtering magnetron CNx films

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 1-8

  Lejeune, M ^a   Durand Drouhin, O ^a   Charvet, S ^a   Grosman, A ^b   Ortega, C ^b   Benlahsen, M ^a  

^a Universite de Picardie Jules Verne   (France)

^b CNRS   (France)

Author keywords

Carbon; Fourier transform infrared spectroscopy; Nitrides; Sputtering

Indexed keywords

MAGNETRON SPUTTERING; MICROSTRUCTURE; PLASMAS; THIN FILM CIRCUITS;

PLASMA PARAMETERS;

CARBON NITRIDE;

EID: 0142011478     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00902-7     Document Type: Article

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