Influence of substrate bias voltage on the properties of CNx films prepared by reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 3, 1999, Pages 899-908

  Hajek, V ^a   Rusnak, K ^a   Vlcek, J ^a   Martinu, L ^b   Gujrathi, S C ^c  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^c UNIVERSITÉ DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041449511     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581662     Document Type: Article

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