Effect of target self-bias on carbon nitride thin films deposited by RF magnetron sputtering

Solid State Communications

Volumn 118, Issue 4, 2001, Pages 179-182

  Durand Drouhin, O ^a   Lejeune, M ^a   Clin, M ^a   Ballutaud, D ^b   Benlahsen, M ^a  

^a Universite de Picardie Jules Verne   (France)

^b Centre National de la Recherche Scientifique   (France)

Author keywords

A. Disordered systems; A. Surfaces and interferences; A. Thin films; D. Optical properties

Indexed keywords

ABSORPTION SPECTROSCOPY; BINDING ENERGY; CARBON NITRIDE; CRYSTALLINE MATERIALS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; OPTICAL CORRELATION; OPTICAL RESOLVING POWER; RESIDUAL STRESSES; SILICON; SPUTTER DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DISORDERED SYSTEMS; INFRARED TRANSMISSION SPECTROSCOPY;

PROTECTIVE COATINGS;

EID: 0035942290     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(01)00077-1     Document Type: Article

References (19)