The effect of liquid-induced adhesion changes on the interfacial shear strength between self-assembled monolayers

Journal of Adhesion Science and Technology

Volumn 17, Issue 10, 2003, Pages 1385-1401

  Vezenov, Dmitri V ^a,c   Noy, Aleksandr ^a,d   Lieber, Charles M ^a,b  

^a HARVARD UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

^c Nanoptek Inc   (United States)

^d LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Adhesion; Chemical force microscopy; Contact mechanics; Friction; Interfacial shear strength; Self assembled monolayers; Surface free energy

Indexed keywords

FREE ENERGY; FRICTION; INTERFACIAL ENERGY; SELF ASSEMBLY; SHEAR STRENGTH; ENERGY DISSIPATION; METHANOL; PHASE INTERFACES; SELF ASSEMBLED MONOLAYERS; TRIBOLOGY;

CHEMICAL FORCE MICROSCOPY;

ADHESION;

ADHESION FORCES; CARBON COATING; CHEMICAL FORCE MICROSCOPY; CONTACT MECHANICS; DRY GAS; INTERFACIAL SHEAR STRENGTH; METHANOL-WATER; REDUCING-FRICTION; SILOXANE MONOLAYERS; SINGLE ASPERITY; SOLID/LIQUID; SURFACE FREE ENERGY; WATER MIXTURE;

EID: 0142007154     PISSN: 01694243     EISSN: None     Source Type: Journal    
DOI: 10.1163/156856103769172805     Document Type: Article

References (45)

1. A. R. Burns, J. E. Houston, R. W. Carpick and T. A. Michalske, Langmuir 15, 2922 (1999).
2. M. Enachescu, R. J. A. Vandenoetelaar, R. W. Carpick, D. F. Ogletree, C. F. J. Flipse and M. Salmeron, Phys. Rev. Lett. 81, 1877 (1998).
3. M. A. Lantz, S. J. Oshea and M. E. Welland, Phys. Rev. B 56, 15345 (1997).
4. R. W. Carpick and M. Salmeron, Chem. Rev. 97, 1163 (1997).
5. U. D. Schwarz, O. Zworner, P. Koster and R. Wiesendanger, Phys. Rev. B 56, 6987 (1997).
6. U. D. Schwarz, O. Zworner, P. Koster and P. Wiesendanger, Phys. Rev. B 56, 6997 (1997).
7. M. A. Lantz, S. J. Oshea, A. C. F. Hoole and M. E. Welland, Appl. Phys. Lett. 70, 970 (1997).
8. D. F. Ogletree, R. W. Carpick and M. Salmeron, Rev. Sci. Instrum. 67, 3298 (1996).
9. U. D. Schwarz, P. Koster and R. Wiesendanger, Rev. Sci. Instrum. 67, 2560 (1996).
10. J. L. Hutter and J. Bechhoefer, Rev. Sci. Instrum. 64, 1868 (1993).
11. J. P. Cleveland, S. Manne, D. Bocek and P. K. Hansma, Rev. Sci. Instrum. 64, 403 (1993).
12. A. Noy, D. V. Vezenov and C. M. Lieber, Annu. Rev. Mater. Sci. 27, 381 (1997).
13. B. Bhushan, in: IEEE Proceedings of the Ninth Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. Nanotribology and Nanomechanics of MEMS Devices, p. 91 (1996).
14. V. V. Tsukruk, Adv. Mater. 13, 95 (2001).
15. C. D. Frisbie, L. F. Rozsnyai, A. Noy, M. S. Wrighton and C. M. Lieber, Science 265, 2071 (1994).
16. A. Schumacher, N. Kruse, R. Prins, E. Meyer, R. Lijthi, L. Howald, H.-J. Güntherodt and L. Scandella, J. Vac. Sci. Technol. B 14, 1264 (1996).
17. M. A. Lantz, S. J. Oshea, M. E. Welland and K. L. Johnson, Phys. Rev. B 55, 10776 (1997).
18. A. Noy, C. D. Frisbie, L. F. Rosznyai, M. S. Wrighton and C. M. Lieber, J. Am. Chem. Soc. 117, 7943 (1995).
19. J.-B. D. Green, M. T. McDermott, M. D. Porter and L. M. Siperko, J. Phys. Chem. 99, 10960 (1995).
20. D. V. Vezenov, A. Noy, L. F. Rozsnyai and C. M. Lieber, J. Am. Chem. Soc. 119, 2006 (1997).
21. H. Yoshizawa and J. Israelachvili, Thin Solid Films 246, 1 (1994).
22. J. Israelachvili, Acc. Chem. Res. 20, 415 (1987).
23. J. Israelachvili, J. Vac. Sci. Technol. A 10, 2961 (1992).
24. Y. L. Chen, C. A. Helm and J. N. Israelachvili, J. Phys. Chem. 95, 10736 (1991).
25. H. Yoshizawa, Y. L. Chen and J. Israelachvili, J. Phys. Chem. 97, 4128 (1993).
26. A. Lio, D. H. Charych and M. Salmeron, J. Phys. Chem. B 101, 3800 (1997).
27. D. V. Vezenov, A. V. Zhuk, G. M. Whitesides and C. M. Lieber, J. Am. Chem. Soc. 124, 10578 (2002).
28. J. Colchero, M. Luna and A. M. Baro, Appl. Phys. Lett. 68, 2896 (1996).
29. Y. Liu, T. Wu and D. F. Evans, Langmuir 10, 2241 (1994).
30. R. W. Carpick, D. F. Ogletree and M. Salmeron, Appl. Phys. Lett. 70, 1548 (1997).
31. J. L. Hazel and V. V. Tsukruk, Thin Solid Films 339, 249 (1999).
32. S. S. Sheiko, M. Moller, E. M. C. M. Reuvekamp and H. W. Zandbergen, Phys. Rev. B 48, 5675 (1993).
33. R. McKendry, M.-E. Theoclitou, C. Abell and T. Rayment, Langmuir 14, 2846 (1998).
34. C. Putman and R. Kaneko, Thin Solid Films 273, 1 (1996).
35. X. Xiao, J. Hu, D. H. Charych and M. Salmeron, Langmuir 12, 235 (1996).
36. U. D. Schwarz, W. Allers, G. Gensterblum and R. Wiesendanger, Phys. Rev. B 52, 14976 (1995).
37. E. Meyer, R. Luthi, L. Howald, M. Bammerlin, M. Guggisberg and H.-J. Güntherodt, J. Vac. Sci. Technol. B 14, 1285 (1996).
38. R. W. Carpick, N. Agrait, D. F. Ogletree and M. Salmeron, J. Vac. Sci. Technol. B 14, 1289 (1996).
39. R. W. Carpick, N. Agrait, D. F. Ogletree and M. Salmeron, Langmuir 12, 3334 (1996).
40. K. L. Johnson, Proc. Royal Soc. London A 453, 163 (1997).
41. B. V. Derjaguin, V. M. Muller and Yu. P. Toporov, J. Colloid Interface Sci. 53, 314 (1975).
42. V. M. Muller, V. S. Yushchenko and B. V. Derjaguin, J. Colloid Interface Sci. 77, 91 (1980).
43. D. Maugis, J. Colloid Interface Sci. 150, 243 (1992).
44. M. G. D. El-Sherbiney and J. Halling, Wear 40, 325 (1976).
45. H. Liu, S. I.-U. Ahmed and M. Scherge, Thin Solid Films 381, 135 (2001).