Mechanism of initial adsorption of NO on the Si(100) surface

Physical Review B - Condensed Matter and Materials Physics

Volumn 68, Issue 7, 2003, Pages

  Kim, K ^a   Ahn, R ^a   Choi, H ^a   Lee, S ^a   Yeom, W ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

NITRIC OXIDE; SILICON;

ADSORPTION; ARTICLE; CHEMICAL BINDING; DISSOCIATION; ENERGY; SYNCHROTRON RADIATION; TEMPERATURE DEPENDENCE;

EID: 0141850043     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.68.075323     Document Type: Article

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