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Volumn 113, Issue 18, 2000, Pages 8237-8248
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Theoretical investigation of the initial reaction of the NO decomposition on the Si (100) (2×1) reconstructed surface
a
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Author keywords
[No Author keywords available]
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Indexed keywords
BOUNDARY CONDITIONS;
DECOMPOSITION;
FILM GROWTH;
NITRIDES;
NITROGEN;
OXYGEN;
SILICON WAFERS;
SURFACE PHENOMENA;
SURFACE STRUCTURE;
DENSITY FUNCTIONAL THEORY (DFT);
NITRIC OXIDE;
OXYNITRIDES;
NITROGEN OXIDES;
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EID: 0034323436
PISSN: 00219606
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (12)
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References (4)
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