Initial stage of NO adsorption on Si(100)-(2×1) studied by synchrotron radiation photoemission and photodesorption

Surface Science

Volumn 467, Issue 1-3, 2000, Pages 49-57

  Carbone, M ^a   Bobrov, K ^a   Comtet, G ^a   Dujardin, G ^a   Hellner, L ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; DESORPTION; DISSOCIATION; GAS ADSORPTION; IONIZATION OF GASES; NITROGEN OXIDES; PHOTOEMISSION; SPECTROSCOPIC ANALYSIS; SURFACE PHENOMENA; SYNCHROTRON RADIATION; THERMAL EFFECTS;

PHOTON STIMULATED DESORPTION (PSD); SYNCHROTRON RADIATION PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0034320774     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00714-7     Document Type: Article

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