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Volumn 77, Issue 2, 2000, Pages 220-222
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Reoxidation effects on the chemical bonding states of nitrogen accumulated at the oxynitride/silicon interface
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0001235265
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.126930 Document Type: Article |
Times cited : (20)
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References (12)
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