Formation of interfacial layer during reactive sputtering of hafnium oxide

Journal of Applied Physics

Volumn 93, Issue 12, 2003, Pages 10119-10124

  Tsui, Bing Yue ^a   Chang, Hsiu Wei ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

HAFNIUM COMPOUNDS; OXIDATION; PERMITTIVITY; PHYSICAL VAPOR DEPOSITION; SILICA; SPUTTERING;

SPUTTERING CHAMBERS;

SURFACE CHEMISTRY;

EID: 0038819583     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1574594     Document Type: Article

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