Boron diffusion in silicon oxides and oxynitrides

Journal of the Electrochemical Society

Volumn 145, Issue 6, 1998, Pages 2068-2074

  Ellis, K A ^a   Buhrman, R A ^a  

^a Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFUSION IN SOLIDS; MATHEMATICAL MODELS; MONTE CARLO METHODS; MOS DEVICES; NITRIDES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES;

OXYNITRIDES; SILICON OXIDES;

BORON;

EID: 0032097083     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838598     Document Type: Article

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