Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering; Role of low-energy ion irradiation in determining microstructure and mechanical properties

Journal of Applied Physics

Volumn 93, Issue 5, 2003, Pages 3002-3015

  Neidhardt, J ^a   Czigany, Zs ^a,b   Brunell, I F ^a,c   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^c CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CARBON NITRIDE; CATHODES; CROSSLINKING; DESORPTION; FULLERENES; GRAPHITE; HARDNESS; HIGH RESOLUTION ELECTRON MICROSCOPY; IRRADIATION; MAGNETIC FIELDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; NITROGEN; PLASMAS; SILICON;

LOW-ENERGY ION IRRADIATION;

THIN FILMS;

EID: 0037348089     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1538316     Document Type: Article

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