Macromolecule formation in low density CF4 plasmas: The influence of H2

Journal of Applied Physics

Volumn 93, Issue 3, 2003, Pages 1389-1402

  Schabel, M J ^a,b   Peterson, T W ^a   Muscat, A J ^a  

^a UNIVERSITY OF ARIZONA   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DISSOCIATION; ELECTRIC DISCHARGES; FLUOROCARBONS; MACROMOLECULES;

RADIO FREQUENCY PLASMA CHAMBERS;

PLASMAS;

EID: 0037320121     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1535747     Document Type: Article

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