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Volumn 33, Issue 7S, 1994, Pages 4181-
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CFX(X=1–3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition
a a a a |
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
CHEMICAL VAPOR DEPOSITION;
ELECTRON RESONANCE;
FLUOROCARBONS;
INFRARED SPECTROSCOPY;
PLASMA DENSITY;
PLASMAS;
PLASTIC FILMS;
SEMICONDUCTING SILICON;
SEMICONDUCTOR LASERS;
SILICA;
SURFACES;
ELECTRON CYCLOTRON RESONANCE PLASMA;
INFRARED DIODE LASER ABSORPTION SPECTROSCOPY;
ON OFF MODULATED PLASMA;
X RAY PHOTOELECTRON SPECTROSCOPY;
FREE RADICALS;
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EID: 0028462138
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.33.4181 Document Type: Article |
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Times cited : (45)
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References (9)
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