Atomic layer deposition of TiO 2 thin films from TiI 4 and H 2 O

Applied Surface Science

Volumn 193, Issue 1-4, 2002, Pages 277-286

  Aarik, Jaan ^a   Aidla, Aleks ^a   Uustare, Teet ^a   Kukli, Kaupo ^a   Sammelselg, Väino ^a   Ritala, Mikko ^b   Leskelä, Markku ^b  

^a UNIVERSITY OF TARTU   (Estonia)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Atomic layer deposition; Crystal structure; Epitaxy; Surface reactions; Titanium dioxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; EPITAXIAL GROWTH; THERMAL EFFECTS; THIN FILMS; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITIONS (ALD);

SURFACE STRUCTURE;

EID: 0037024020     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00497-X     Document Type: Article

References (34)

1. Inorganic chemistry