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Volumn 38, Issue 10, 1999, Pages 6034-6038
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Structural and electrical properties of crystalline TiO2 thin films formed by metalorganic decomposition
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
ANNEALING;
CRYSTAL STRUCTURE;
CRYSTALLINE MATERIALS;
CRYSTALLIZATION;
DECOMPOSITION;
LEAKAGE CURRENTS;
SEMICONDUCTING SILICON;
SILICA;
SUBSTRATES;
THIN FILMS;
TITANIUM OXIDES;
METALORGANIC DECOMPOSITION;
SEMICONDUCTING FILMS;
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EID: 0033317772
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.6034 Document Type: Article |
Times cited : (53)
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References (22)
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