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Volumn 38, Issue 10, 1999, Pages 6034-6038

Structural and electrical properties of crystalline TiO2 thin films formed by metalorganic decomposition

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; CRYSTALLIZATION; DECOMPOSITION; LEAKAGE CURRENTS; SEMICONDUCTING SILICON; SILICA; SUBSTRATES; THIN FILMS; TITANIUM OXIDES;

EID: 0033317772     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6034     Document Type: Article
Times cited : (53)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.