Low-loss dielectric mirror with ion-beam-sputtered TiO2–SiO2 mixed films

Applied Optics

Volumn 40, Issue 13, 2001, Pages 2177-2182

  Chao, Shiuh ^a   Wang, Wen Hsiang ^a   Lee, Cheng Chung ^b   Gannaway, Fred C ^b   Hamilton, Peter A ^b   Lee, Clare ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIELECTRIC MATERIALS; ION BEAMS; LASER DAMAGE; MIRRORS; NUMERICAL METHODS; PHASE TRANSITIONS; REFRACTIVE INDEX; SILICA; SPUTTERING; THERMAL EFFECTS; TITANIUM OXIDES;

LASER-DAMAGE RESISTANCE;

THIN FILMS;

EID: 0005783068     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.002177     Document Type: Article

References (11)

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