Materials issues for layered tunnel barrier structures

Journal of Applied Physics

Volumn 92, Issue 1, 2002, Pages 261-267

  Casperson, Julie D ^a   Bell, L Douglas ^b   Atwater, Harry A ^a  

^a California Institute of Technology   (United States)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARCHIVAL DATA; BAND OFFSETS; CANDIDATE MATERIALS; FOWLER-NORDHEIM TUNNELING; I - V CURVE; NONVOLATILE FLOATING-GATE MEMORY DEVICES; PROGRAM/ERASE; SILICON ELECTRONICS; TUNNEL BARRIER; TUNNEL BARRIER MATERIALS;

COMPUTER SIMULATION; THERMIONIC EMISSION;

DIELECTRIC MATERIALS;

EID: 0036639637     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1479747     Document Type: Article

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