In situ growth of evaporated TiO2 thin films using oxygen radicals: Effect of deposition temperature

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2495-2500

  Grahn, J V ^a   Linder, M ^a   Fredriksson, E ^b,c  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b UPPSALA UNIVERSITY   (Sweden)

^c ABB CORPORATE RESEARCH   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032337229     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581371     Document Type: Article

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