Plasma damage characterization of the decoupled plasma source (DPS) reactor

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1996, Pages 215-218

  Krishnan, Srikanth ^a   Hallet, Bill ^a   Schell, J ^a   Webb, Timothy R ^a   Shiau, Jay ^a   Loewenhardt, Peter K ^a   Ma, Diana X ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; CMOS INTEGRATED CIRCUITS; ELECTRIC INVERTERS; ELECTROMAGNETIC FIELDS; ION SOURCES; LEAKAGE CURRENTS; PLASMA DENSITY; PLASMA SOURCES; SILICON WAFERS;

CMOS INVERTER CIRCUIT; DECOUPLED PLASMA SOURCE REACTOR; ELECTROSTATIC CHUCK; HIGH DENSITY PLASMA ETCH EQUIPMENT; ION CURRENT FLUX NONUNIFORMITY; ION FLUX; ION UNIFORMITY; MECHANICAL WAFER CLAMPING; PLASMA DAMAGE; PLASMA GEOMETRY OPTIMIZATION;

ELECTRIC REACTORS;

EID: 0029722237     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)