SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1298-1303

Ion energy and angular distribution at the radio frequency biased electrode in an inductively coupled plasma apparatus

(2) Mizutani, N a Hayashi, T a

a ULVAC INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; ELECTRIC POTENTIAL; ELECTRODES; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PLASMA SHEATHS; SUBSTRATES;

CHARGE EXCHANGE; ION ENERGY DISTRIBUTIONS (IED);

PLASMA ETCHING;

EID: 0035393227 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1381404 Document Type: Article

Times cited : (29)

References (28)

1
- 0033157768
- (1999) Jpn. J. Appl. Phys., Part 1 , vol.38 , pp. 4465
- Hikosaka, Y.¹ Hayashi, H.² Sekine, M.³ Tsuboi, T.⁴ Endo, M.⁵ Mizutani, N.⁶

2
- 0015483966
- (1972) J. Appl. Phys. , vol.43 , pp. 4965
- Coburn, J.W.¹ Kay, E.²

3
- 36549100753
- (1986) J. Appl. Phys. , vol.59 , pp. 1890
- Thompson, B.E.¹ Allen, K.D.² Richards, A.D.³ Sawin, H.H.⁴

4
- 0000765561
- (1988) J. Appl. Phys. , vol.63 , pp. 1367
- Greene, W.M.¹ Hartney, M.A.² Oldham, W.G.³ Hess, D.W.⁴

5
- 84921131731
- (1989) J. Vac. Sci. Technol. A , vol.7 , pp. 3332
- Smith, A.M.¹ Beilby, B.N.² Horwitz, C.M.³

6
- 0000393088
- (1989) Appl. Phys. Lett. , vol.54 , pp. 505
- Wild, C.¹ Koidl, P.²

7
- 36449001598
- (1991) J. Appl. Phys. , vol.69 , pp. 2909
- Wild, C.¹ Koidl, P.²

8
- 0000528150
- (1990) J. Appl. Phys. , vol.68 , pp. 3916
- Liu, J.¹ Huppert, G.L.² Sawin, H.H.³

9
- 0030213902
- (1996) J. Appl. Phys. , vol.80 , pp. 1304
- Woodworth, J.R.¹ Riley, M.E.² Meister, D.C.³ Aragon, B.P.⁴ Le, M.S.⁵ Sawin, H.H.⁶

10
- 0032335990
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 3389
- Nichols, C.A.¹ Woodworth, J.R.² Hamilton, T.W.³

11
- 0033157551
- (1999) Jpn. J. Appl. Phys., Part 1 , vol.38 , pp. 4397
- Rees, J.A.¹ Greenwood, C.L.² Seymour, D.L.³

12
- 0033751203
- (2000) Jpn. J. Appl. Phys., Part 1 , vol.39 , pp. 1435
- Matsutani, A.¹ Ohtsuki, H.² Koyama, F.³ Iga, K.⁴

13
- 0031268393
- (1997) Jpn. J. Appl. Phys., Part 2 , vol.36
- Mizutani, N.¹ Hayashi, T.²

14
- 0000065286
- (1998) Rev. Sci. Instrum. , vol.69 , pp. 1918
- Mizutani, N.¹ Nagata, Y.² Kubo, A.³ Hayashi, T.⁴

15
- 0001471861
- (1988) J. Appl. Phys. , vol.63 , pp. 1894
- Kuypers, A.D.¹ Hopman, H.J.²

16
- 0000065291
- (1990) J. Appl. Phys. , vol.67 , pp. 1229
- Kuypers, A.D.¹ Hopman, H.J.²

17
- 0033445241
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 506
- Edelberg, E.A.¹ Perry, A.² Benjamin, N.³ Aydil, E.S.⁴

18
- 0031525615
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 2859
- Tsuda, O.¹ Tatebayashi, Y.² Takamura, Y.Y.³ Yoshida, T.⁴

19
- 0032669695
- (1999) Plasma Sources Sci. Technol. , vol.8 , pp. 392
- Tsuda, O.¹ Tatebayashi, Y.² Takamura, Y.Y.³ Yoshida, T.⁴

20
- 0033322656
- (1999) Jpn. J. Appl. Phys., Part 1 , vol.38 , pp. 4206
- Mizutani, N.¹ Hayashi, T.²

21
- 0034291965
- (2000) Thin Solid Films , vol.374 , pp. 167
- Mizutani, N.¹ Hayashi, T.²

22
- 0004508958
- Japan Society of Applied Physics, Hokkaido, Japan, in Japanese
- (2000) Extended Abstracts of 61st Autumn Meeting 2000 , Issue.1 , pp. 89
- Mizutani, N.¹ Yamamuro, K.² Hayashi, T.³

23
- 0004477519
- American Vacuum Society, Boston, MA
- (2000) Abstracts of 47th International Symposium , pp. 93
- Mizutani, N.¹ Yamamuro, K.² Hayashi, T.³

24
- 0004518533
- Japan Society of Applied Physics, Kyoto, Japan
- (2001) Proceedings of Plasma Science Symposium 2001 and The 18th Symposium on Plasma Processing , pp. 361
- Mizutani, N.¹ Hayashi, T.²

25
- 0004505450
- (1988) J. Vac. Sci. Technol. A , vol.6 , pp. 2583
- Taylor, P.A.¹

26
- 0014354567
- (1968) J. Appl. Phys. , vol.39 , pp. 5723
- Benoit-Cattin, P.¹ Bernard, L.C.²

27
- 36049053689
- (1968) Phys. Rev. , vol.168 , pp. 107
- Tsui, R.T.C.¹

28
- 0001026457
- (1970) J. Phys. Soc. Jpn. , vol.29 , pp. 187
- Okamoto, Y.¹ Tamagawa, H.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.