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Volumn 30, Issue 26, 1997, Pages 8410-8419

Confinement of block copolymers on patterned surfaces

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMATIONS; INTERFACIAL ENERGY; PLASTIC DEFORMATION; PLASTIC FILMS; POLYSTYRENES; SILICON; SURFACE ROUGHNESS;

EID: 0031373299     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma9615009     Document Type: Article
Times cited : (41)

References (30)
  • 3
    • 85033167860 scopus 로고    scopus 로고
    • note
    • We neglect throughout this paper the statistical high freqency roughness of the substrate and copolymer films. This roughness is always on the order of 5 Å and is therefore negligible.
  • 20
    • 85033171062 scopus 로고    scopus 로고
    • note
    • Independently from the AFM pictures we did X-ray scattering measurements to confirm the anticonformal structures. From the particular phases of the intensity oscillations measured along the rods in reciprocal space, which are given by the lateral periodicity, we can rule out a conformal arrangement for the films shown in parts b and c of Figure 3 (see ref 11).
  • 21
    • 85033180604 scopus 로고    scopus 로고
    • Private communication
    • Sauer, B. B. Private communication.
    • Sauer, B.B.1
  • 22
    • 85033162340 scopus 로고    scopus 로고
    • note
    • 2 staining.
  • 25
    • 85033160045 scopus 로고    scopus 로고
    • note
    • For very large film thicknesses, the degree of orientation of the lamellae parallel to the surface diminishes. In this case island formation is not that efficient and the roughness is attenuated as strong as in the conformal case.
  • 30
    • 85033179976 scopus 로고    scopus 로고
    • note
    • c ∼ L/2.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.