Effects of deposition conditions on the fluorine and hydrogen concentration in tantalum pentoxide (Ta2O5) thin films prepared by plasma enhanced chemical vapor deposition using a tantalum pentafluoride (TaF5) source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3235-3239

  Luo, E Z ^a   Sundaravel, B ^a   Guo, H Y ^a   Wilson, I H ^a   Four, S ^b   Devine, R A B ^b  

^a CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^b ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033432503     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582048     Document Type: Article

References (15)

1. P. Balk, Adv. Mater. 7, 703 (1995).
2. T. Ohmi, Jpn. J. Appl. Phys., Part 1 33, 6747 (1994).
3. J.-L. Autran, R. Devine, C. Chaneliere, and B. Balland, IEEE Electron Device Lett. 18, 447 (1997).
4. G. B. Alers, D. J. Werder, Y. Chabal, H. C. Lu, E. P. Gusev, E. Garfunkel, T. Gustafsson, and R. S. Urdahl, Appl. Phys. Lett. 78, 1517 (1998).
5. T. Aoyama, S. Saida, Y. Okayama, M. Fujisaki, K. Imai, and T. Arikado, J. Electrochem. Soc. 143, 977 (1996).
6. S. Four, R. A. B. Devine, E. Z. Luo, I. H. Wilson, and H. S. Cheng, J. Non-Cryst. Solids 245, 139 (1999).
7. N. P. Barradas, C. Jeynes, and R. Webb, Appl. Phys. Lett. 71, 291 (1997); Technical manual of RBS Data Furnace V2.1 (1998).
8. N. P. Barradas, C. Jeynes, and R. Webb, Appl. Phys. Lett. 71, 291 (1997); Technical manual of RBS Data Furnace V2.1 (1998).
9. SIMNRA V4.0, Max-Plank-Institut fuer Plassmaphysik, Germany.
10. D. Dieumegard, B. Maurel, and G. Amsel, Nucl. Instrum. Methods 168, 93 (1980).
11. J. D. Borgardt, M. D. Ashbaugh, L. C. McIntrye, Jr., J. O. Stoner, Jr., R. B. Gregory, M. Azrak, and J. Wetzel, Nucl. Instrum. Methods Phys. Res. B 136-138, 528 (1998).
12. J. B. Biersack and L. G. Haggmark, Nucl. Instrum. Methods 174, 257 (1980).
13. Handbook of Modern Ion Beam Materials Analysis, edited by J. R. Tsmer and M. Nastasi (Materials Research Society, Pittsburgh, 1995).
14. S. Watanabe, N. Nakayama, and T. Ito, Appl. Phys. Lett. 59, 1458 (1991).
15. K. Oura, M. Naitoh, F. Shoji, J. Yamane, K. Umezawa, and T. Hanawa, Nucl. Instrum. Methods Phys. Res. B 45, 199 (1990).