Chemical vapor deposition stability diagram for the Bil3-O2 system

Journal of the Electrochemical Society

Volumn 145, Issue 12, 1998, Pages 4234-4239

  Schuisky, Mikael ^a   Harsta, Anders ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MAGNESIA; SUBSTRATES; THERMAL EFFECTS; THERMODYNAMIC STABILITY; THIN FILMS;

BISMUTH OXIDES; PRECURSOR MATERIALS;

BISMUTH COMPOUNDS;

EID: 0032300406     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838942     Document Type: Article

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