Dielectric constants of Ta2O5 thin films deposited by r.f. sputtering

Thin Solid Films

Volumn 277, Issue 1-2, 1996, Pages 1-4

  Shibata, Susumu ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Deposition process; Dielectrics; Sputtering; Tantalum

Indexed keywords

ARGON; CRYSTALLIZATION; DIELECTRIC FILMS; ELECTRON DIFFRACTION; HEATING; OXYGEN; PERMITTIVITY; SPUTTER DEPOSITION; TANTALUM COMPOUNDS;

DIODE RADIO FREQUENCY SPUTTERING; ELECTRON DIFFRACTION ANALYSIS; ELECTRON DIFFRACTOGRAM; SPUTTERING POWER; TANTALUM OXIDE;

THIN FILMS;

EID: 0030142692     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08234-4     Document Type: Article

References (7)

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5. A.S.T.M. X-ray Powder Data Card, No. 25-922.
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