SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 365, Issue 2, 2000, Pages 348-367

Modeling and simulation of plasma etching reactors for microelectronics

(1) Economou, Demetre J a

a University of Houston (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL LATTICES; MICROELECTRONIC PROCESSING; PLASMA DEVICES; PLASMA ETCHING; PLASMA SHEATHS; THIN FILMS;

PLASMA ETCHING REACTORS;

SEMICONDUCTING FILMS;

EID: 0033735086 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(99)01056-1 Document Type: Article

Times cited : (74)

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