Consequences of asymmetric pumping in low pressure plasma processing reactors: A three-dimensional modeling study

Journal of Applied Physics

Volumn 82, Issue 11, 1997, Pages 5312-5320

  Kushner, Mark J ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000291573     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366297     Document Type: Article

References (15)

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