Ultra-thin oxide reliability for ULSI applications

Semiconductor Science and Technology

Volumn 15, Issue 5, 2000, Pages 425-435

  Wu, Ernest Y ^a   Stathis, James H ^b   Han, Liang Kai ^c  

^a IBM MICROELECTRONICS   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDES; RELIABILITY; THERMAL EFFECTS; ULTRATHIN FILMS; WEIBULL DISTRIBUTION;

ULTRA-THIN OXIDES;

ULSI CIRCUITS;

EID: 0033731870     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/15/5/301     Document Type: Article

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