Novel surface reaction model in dry-etching process simulator

Japanese Journal of Applied Physics

Volumn 31, Issue 12 S, 1992, Pages 4363-4369

  Misaka, Akio ^a   Harafuji, Kenji ^a   Kubota, Masafumi ^a   Nomura, Noboru ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Dry etching; Experiments; Ion assisted etching; Micro loading effect; Surface reaction; Topography simulation

Indexed keywords

COMPUTER SIMULATION; INTEGRATED CIRCUIT MANUFACTURE; ION BEAMS; SILICA;

DRY ETCHING; MICROLOADING EFFECTS;

ETCHING;

EID: 0027003734     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.31.4363     Document Type: Article

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